Equipment Lithography and wafer bonding

Developer Wet Benches

Photoresist Developer Wet Bench (Located in the Yellow Room, 819F)     E-Beam Developer Wet Bench (Located in the E-Beam Room, 819E)

Raith 150Two E-Beam Pattern Generator

Applications Nanolithography Low Energy Electron Beam Lithography Imaging Specs Resolution < 5nm Field stitching ~ 25 nm Overlay error ~ ≤ 40nm Environmentally-Controlled Enclosure 0.1-30 keV beam voltage 5 pA to 20 nA beam current 1.6 nm spot size Allowed User Materials Wafers or wafer pieces (new or previously processed)…

Suss MA 6 Contact Aligner

Alignment Modes Top Side Back Side Exposure Modes Soft Contact Hard Contact Vacuum Contact Low vacuum contact Flood Proximity Specs Resolution ~ 2.5 µm Alignment Precision down to 0.5 µm Light Uniformity ~ 5% Allowed User Materials Wafers or wafer pieces (new or previously processed) Photoresist Lift-Off Resist Photomasks Metals…