Applications
- Thickness measurements of thin films
- Measurement of index of refraction of thin films
Specs
- Thickness measurement range: 40nm-40µm
- 190-1100 nm wavelength range
- 7 µm spot size
Allowed User Materials
- Wafers or wafer pieces (new or previously processed)
- Metals
- Dielectrics
Example Processes:
Thickness measurement of a thin SiO2 or SiNx film