Applications

• Thickness measurements of thin films
• Measurement of index of refraction of thin films

Specs

• Thickness measurement range: 40nm-40µm
• 190-1100 nm wavelength range
• 7 µm spot size

Allowed User Materials

• Wafers or wafer pieces (new or previously processed)
• Metals
• Dielectrics

Example Processes:

Thickness measurement of a thin SiO₂ or SiN_x film