equipment | Deposition and Dry Etching

Nano-36 Thermal Evaporator


Applications

  • Depositing thin layers of a metal on a sample surface

Specs

  • 3 source thermal evaporation
  • ±5% deposition uniformity across 6” wafer

Allowed User Materials

  • Wafers or wafer pieces (new or previously processed)
  • Photoresist
  • Lift-Off Resist

Example Processes:

  • Evaporating a layer of Au 100nm thick for use as an alignment mark
  • Evaporating a 30 nm total thickness Cr/Au layer for use as a metal contact

Safety Guidlines


Nano-36 Standard Operating Procedure

Point of Contact


Aleena Saeed

Nanofabrication Engineer

James Burnette

Manager, Cleanroom and Shared Instrumentation Facilities