equipment | Metrology

Nikon LV150N Optical Microscope


  • Objectives: 5x,10x, 20x, 50x, 100x
  • Digital Camera System
  • Bright-field Imaging
  • Dark-field imaging
  • Polarized imaging


  • Allowed User Materials
  • Wafers or wafer pieces (new or previously processed)
  • Photoresist
  • Lift-Off Resist
  • E-beam resist
  • Metals
  • Dielectrics

Example Processes:

  • Bright-field inspection of wafer surface
  • Dark-field inspection of wafer surface to determine particle contamination density

Safety Guidlines

Nikon LV 150 N Microscope Standard Operating Procedure


NYU Tandon NanoFab Cleanroom  
6 Metro Tech Center
Room 819A
Brooklyn, NY 11201

Jacob Trevino, PhD