NYU Users
| Equipment | User Rates ($/hr.) | Training ($/hr.) |
| Raith 150Two | 50 | 90 |
| IBE | 80 | 100 |
| ALD | 30 | 80 |
| PVD | 35 | 80 |
| Nano-36 | 20 | 70 |
| Filmetrics F40 UV | 15 | 25 |
| PlasmaEtch PE-50 | 30 | 40 |
| UVOCS UV Ozone | 10 | 30 |
| Süss MA-6 Contact Aligner | 30 | 70 |
| Photoresist SpinCoat and Development Stations | 0 | 25 |
Outside Academic Users
| Equipment | User Rates ($/hr.) | Training ($/hr.) |
| Raith 150Two | 60 | 90 |
| IBE | 90 | 100 |
| ALD | 40 | 80 |
| PVD | 45 | 80 |
| Nano-36 | 25 | 70 |
| Filmetrics F40 UV | 15 | 25 |
| PlasmaEtch PE-50 | 35 | 40 |
| UVOCS UV Ozone | 10 | 30 |
| Süss MA-6 Contact Aligner | 35 | 70 |
| Photoresist SpinCoat and Development Stations | 0 | 25 |
Industrial Users
| Equipment | User Rates ($/hr.) | Training ($/hr.) |
| Raith 150Two | 175 | 90 |
| IBE | 140 | 100 |
| ALD | 100 | 80 |
| PVD | 90 | 80 |
| Nano-36 | 60 | 70 |
| Filmetrics F40 UV | 45 | 25 |
| PlasmaEtch PE-50 | 80 | 40 |
| UVOCS UV Ozone | 50 | 30 |
| Süss MA-6 Contact Aligner | 60 | 70 |
| Photoresist SpinCoat and Development Stations | 0 | 25 |