NYU Tandon | NYU Tandon NanoFab Cleanroom

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User Name*
Last Name, First Name, Middle Initial
User Affiliation*
NYU, Outside Academic, Industry
Email Address*
email address of user
NYU N Number (If applicable)
Phone number*
Principal Investigator (PI-If applicable)*
Name of PI associated with project
Scope of Project*
Brief Description of Experiments to be conducted in NanoFab
Equipment to be Used*
- Suss Contact Aligner
- Raith E-Beam Pattern Generator
- Proline 75 PVD System
- Nano-36 Thermal Evaporation
- ALD 150 LX ALD System
- Nanoquest IBE System
- Nikon Microscope
- Filmetrics Thin Film Measurement Tool
- PlasmaEtch PE-50 O2 Plasma System
- UVOCS UV Ozone System
List of equipment user needs to gain access to.
Chemicals to be used*
- Photoresist
- E-beam resist
- Solvents
- Acids
- Corrosives
Type of Chemicals user will require during fabrication activities
Photoresist Types (AZ 5214e, etc.)
Types of photoresist
E-Beam Resist Types (HSQ, ZEP, etc.)
E-Beam resist types
Type of Solvent (Acetone, IPA, methanol, DMSO, etc.)
Solvent Types
Type of Acid (HF, sulfuric acid, etc.)
Acid Types
Type of Corrosives (KOH, etc.)
Type of Corrosives
Metals and Dielectrics (Silicon Oxide, Au, Cr, Al, Pt, etc.)
Metals and Dielectrics
NYU Chartfield
Account Fund Org./Dept. Program Project
NYU Chartfield Information for training fees, equipment usage fees, and pharmacy purchases.
Outside Academic and Industrial Users
Billing Information
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